BS ISO 14706:2014
Current
The latest, up-to-date edition.
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Hardcopy , PDF
English
31-07-2014
Foreword
Introduction
1 Scope
2 Normative reference
3 Terms and definitions
4 Abbreviated terms
5 Principle
6 Apparatus
7 Environment for specimen preparation and measurement
8 Calibration reference materials
9 Safety
10 Measurement procedure
11 Expression of results
12 Precision
13 Test report
Annex A (informative) - Reference materials
Annex B (informative) - Relative sensitivity factor
Annex C (informative) - Preparation of reference materials
Annex D (informative) - VPD-TXRF method
Annex E (informative) - Glancing-angle settings
Annex F (informative) - International inter-laboratory test
results
Bibliography
Defines a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.
| Committee |
CII/60
|
| DevelopmentNote |
Supersedes 99/122512 DC. (07/2005) Supersedes 13/30281604 DC. (08/2014)
|
| DocumentType |
Standard
|
| Pages |
36
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
| Supersedes |
This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.
The method is applicable to the following:
elements of atomic number from 16 (S) to 92 (U);
contamination elements with atomic surface densities from 1×1010 atoms/cm2 to 1×1014 atoms/cm2;
contamination elements with atomic surface densities from 5×108 atoms/cm2 to 5×1012atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method (see 3.4).
| Standards | Relationship |
| ISO 14706:2014 | Identical |
| ISO 14644-1:2015 | Cleanrooms and associated controlled environments — Part 1: Classification of air cleanliness by particle concentration |
| ISO 5725-2:1994 | Accuracy (trueness and precision) of measurement methods and results — Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method |
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