Name: NEN ISO 17331 : 2004 AMD 1 2010 - SURFACE CHEMICAL ANALYSIS - CHEMICAL METHODS FOR THE COLLECTION OF ELEMENTS FROM THE SURFACE OF SILICON-WAFER WORKING REFERENCE MATERIALS AND THEIR DETERMINATION BY TOTAL-REFLECTION X-RAY FLUORESCENCE (TXRF) SPECTROSCOPY
Brand: Netherlands Standards

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SURFACE CHEMICAL ANALYSIS - CHEMICAL METHODS FOR THE COLLECTION OF ELEMENTS FROM THE SURFACE OF SILICON-WAFER WORKING REFERENCE MATERIALS AND THEIR DETERMINATION BY TOTAL-REFLECTION X-RAY FLUORESCENCE (TXRF) SPECTROSCOPY

Published date

12-01-2013

Publisher

Netherlands Standards

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Defines chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.