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AS ISO 14237-2006

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Available format(s)

Hardcopy , PDF 1 User , PDF 3 Users , PDF 5 Users , PDF 9 Users

Withdrawn date

06-06-2019

Language(s)

English

Published date

10-20-2006

Preview

1 - AS ISO 14237-2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
4 - PREFACE
5 - CONTENTS
6 - INTRODUCTION
7 - 1 Scope
7 - 2 Normative reference
7 - 3 Principle
7 - 4 Reference materials
8 - 5 Apparatus
9 - 6 Specimen
9 - 7 Procedure
12 - 8 Expression of results
14 - 9 Test report
15 - Annex A (informative) Determination of carrier density in silicon wafers
18 - Annex B (informative) Boron isotope ratio measured by SIMS
21 - Annex C (normative) Procedures for evaluation of apparatus performance
23 - Annex D (normative) Procedures for the depth profiling of NIST SRM 2137
26 - Annex E (informative) Statistical report on interlaboratory test programme

Adopts ISO 14237:2000 to specify a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon, using uniformly doped materials calibrated by a certified reference material implanted with boron.

Committee
CH-016
DocumentType
Standard
ISBN
0 7337 7792 9
Pages
22
ProductNote
Withdrawn 06-06-2019.
PublisherName
Standards Australia
Status
Withdrawn
Supersedes

Standards Relationship
ISO 14237:2000 Identical

First published as AS ISO 14237-2006.

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