AS ISO 14237-2006

1 - AS ISO 14237-2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
4 - PREFACE
5 - CONTENTS
6 - INTRODUCTION
7 - 1 Scope
7 - 2 Normative reference
7 - 3 Principle
7 - 4 Reference materials
8 - 5 Apparatus
9 - 6 Specimen
9 - 7 Procedure
12 - 8 Expression of results
14 - 9 Test report
15 - Annex A (informative) Determination of carrier density in silicon wafers
18 - Annex B (informative) Boron isotope ratio measured by SIMS
21 - Annex C (normative) Procedures for evaluation of apparatus performance
23 - Annex D (normative) Procedures for the depth profiling of NIST SRM 2137
26 - Annex E (informative) Statistical report on interlaboratory test programme

Adopts ISO 14237:2000 to specify a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon, using uniformly doped materials calibrated by a certified reference material implanted with boron.

First published as AS ISO 14237-2006.