AS ISO 14606-2006

1 - AS ISO 14606-2006 Surface chemical analysis - Sputter depth profiling - Optimization using layered systems as reference materials
4 - PREFACE
5 - CONTENTS
6 - INTRODUCTION
7 - 1 Scope
7 - 2 Terms and definitions
8 - 3 Symbols and abbreviated terms
8 - 4 Setting parameters for sputter depth profiling
10 - 5 Depth resolution at an ideally sharp interface in sputter depth profiles
12 - 6 Procedures for optimization of parameter settings
15 - Annex A (informative) Factors influencing the depth resolution
17 - Annex B (informative) Typical single-layered systems as reference materials
18 - Annex C (informative) Typicalmultilayered systems used as reference materials
19 - Annex D (informative) Uses of multilayered systems
20 - Bibliography

Adopts ISO 14606:2000 to give guidance on the optimization of sputter depth profiling parameters using appropriate single-layered and multi-layered reference materials in order to achieve optimum depth resolution as a function of instrument settings.

First published as AS ISO 14606-2006.