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DIN 50434:1986-02

Withdrawn

Withdrawn

TESTING OF MATERIALS FOR SEMICONDUCTOR TECHNOLOGY; DETECTION OF CRYSTAL DEFECTS IN MONOCRYSTALLINE SILICON USING ETCHING TECHNIQUES ON (111) AND (100) SURFACES

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-12-2013

Withdrawn date

07-01-2007

The method specified is used to detect crystal defects as described in clause 2 in monocrystalline silicon samples, preferably in slice form, with polished or polish-etched surfaces oriented in the {111} and {100} planes by defect etching. The method is especially suitable for determining the density and distribution of dislocations. It is suitable for n-type and p-type doped silicon with resistivities down to 0,005 omega cm for dislocation densities between 100 and 100000 cm-[2].

DocumentType
Standard
Pages
10
PublisherName
German Institute for Standardisation (Deutsches Institut für Normung)
Status
Withdrawn

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