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DIN 50451-2:2003-04

Withdrawn

Withdrawn

Determination of trace elements in liquids for use in semiconductor technology - Part 2: Determination of calcium, chromium, cobalt, copper, iron, nickel and zinc in hydrofluoric acid by plasma emission spectroscopy

Available format(s)

Hardcopy , PDF

Language(s)

English, German

Published date

04-01-2003

Withdrawn date

10-02-2023

US$67.58
Excluding Tax where applicable

Foreword
1 Scope
2 Normative references
3 Concept
4 Unit
5 Principle
6 Reagents
7 Apparatus and cleaning
8 Sampling
9 Sample pretreatment
10 Preparation of blank solutions
11 Procedure
12 Calculation and expression of results
13 Precision
14 Test report

The method described serves to examine, by plasma-induced (ICP or DCP) spectrometry, hydrofluoric acid for the presence of cobalt (Co), chromium (Cr), copper (Cu) and iron (Fe) and nickel (Ni) in amounts of 1 to 1000 ng/g. The presence of these metals is of relevance in the field of semi-conductor technology.

DocumentType
Standard
Pages
4
PublisherName
German Institute for Standardisation (Deutsches Institut für Normung)
Status
Withdrawn
Supersedes

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ISO 1042:1998 Laboratory glassware — One-mark volumetric flasks
DIN 51008-2:2001-12 OPTICAL EMISSION SPECTROMETRY (OES) - PART 2: TERMS FOR FLAME AND PLASMA SYSTEMS
DIN 8120-1:1981-07 WEIGHING MACHINES; TERMS AND DEFINITIONS
DIN 32645:2008-11 CHEMICAL ANALYSIS - DECISION LIMIT, DETECTION LIMIT AND DETERMINATION LIMIT UNDER REPEATABILITY CONDITIONS - TERMS, METHODS, EVALUATION
ISO 8655-2:2002 Piston-operated volumetric apparatus — Part 2: Piston pipettes
ISO 14644-1:2015 Cleanrooms and associated controlled environments — Part 1: Classification of air cleanliness by particle concentration
ISO 3696:1987 Water for analytical laboratory use — Specification and test methods

US$67.58
Excluding Tax where applicable