ISO 14606:2022
Current
The latest, up-to-date edition.
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
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English
11-21-2022
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
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