NEN ISO 14606 : 2000
Current
Current
SURFACE CHEMICAL ANALYSIS - SPUTTER DEPTH PROFILING - OPTIMIZATION USING LAYERED SYSTEMS AS REFERENCE MATERIALS
Published date
01-12-2013
Publisher
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Provides guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
| DocumentType |
Standard
|
| PublisherName |
Netherlands Standards
|
| Status |
Current
|
| Standards | Relationship |
| ISO 14606:2015 | Identical |
Summarise
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