ASTM E 684 : 2004
Withdrawn
View Superseded by
Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces (Withdrawn 2012)
English
12-31-2010
01-01-2012
CONTAINED IN VOL. 03.06, 2006 Describes the simple and approximate method for determining the current density distribution of ion beams.
| Committee |
E 42
|
| DocumentType |
Standard Practice
|
| Pages |
2
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| SupersededBy | |
| Supersedes |
1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
| ASTM E 1127 : 2008 : R2015 | Standard Guide for Depth Profiling in Auger Electron Spectroscopy (Withdrawn 2024) |
| ASTM E 1127 : 2008 | Standard Guide for Depth Profiling in Auger Electron Spectroscopy |
| BS ISO 14606:2015 | Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials |
| ISO 14606:2015 | Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials |
| ASTM E 1577 : 2011 : REDLINE | Standard Guide for Reporting of Ion Beam Parameters Used in Surface Analysis |
| ASTM E 673 : 2003 | Standard Terminology Relating to Surface Analysis (Withdrawn 2012) |
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