ASTM F 388 : 1984
Withdrawn
Withdrawn
Method for Measurement of Oxide Thickness on Silicon Wafers and Metallization Thickness by Multiple-Beam Interference (Tolansky Method) (Withdrawn 1993)
Published date
12-31-2010
Withdrawn date
12-31-1993
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CONTAINED IN VOL 10.05 1995 Gives destructive method to measure thickness of uniform layer formed or deposited upon a flat surface. For layers 4 to 3000nm thick.
| DocumentType |
Test Method
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| ASTM F 390 : 2011 : REDLINE | Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array |
| ASTM D 1125 : 2014 : REDLINE | Standard Test Methods for Electrical Conductivity and Resistivity of Water (Withdrawn 2023) |
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