BS ISO 14701:2011
Withdrawn
View Superseded by
Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Hardcopy , PDF
English
08-31-2011
11-20-2018
Foreword
Introduction
1 Scope
2 Symbols and abbreviations
3 Outline of method
4 Method for measuring the oxide thickness
Bibliography
Describes several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy.
| Committee |
CII/60
|
| DevelopmentNote |
Supersedes 10/30212265 DC. (08/2011)
|
| DocumentType |
Standard
|
| Pages |
24
|
| PublisherName |
British Standards Institution
|
| Status |
Withdrawn
|
| SupersededBy | |
| Supersedes |
| Standards | Relationship |
| ISO 14701:2011 | Identical |
| ISO 18116:2005 | Surface chemical analysis — Guidelines for preparation and mounting of specimens for analysis |
| ISO/TR 18392:2005 | Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds |
| ISO/IEC Guide 98-3:2008 | Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995) |
Please Login or Create an Account so you can add users to your Multi user PDF Later.
Important note : All end users must be registered with an Account prior to user licenses being assigned.
Users cannot be edited or removed once added to your Multi user PDF.