Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM

Available format(s)

Hardcopy

Language(s)

English

Published date

01-01-2020

Publisher

Netherlands Standards

NEN-ISO 21466 specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method.

Committee	TC 202
DocumentType	Standard
Pages	0
PublisherName	Netherlands Standards
Status	Current

Standards	Relationship
ISO 21466:2019	Identical

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NEN-ISO 21466:2020

Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM

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