SEMI M66:2010(R2021)
Current
Current
The latest, up-to-date edition.
Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique
Available format(s)
Hardcopy
Language(s)
English
Published date
01-11-2021
Continued scaling of CMOS integrated circuit dimensions is reaching a point where materials changes as well as lithographic advances are required to meet the projections of Moore’s Law and the International Technology Roadmap for Semiconductors.
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