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17/30352696 DC : DRAFT SEP 2017

Current

Current

The latest, up-to-date edition.

BS IEC 62047-31 ED1.0 - SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 31: FOUR-POINT BENDING TEST METHOD FOR INTERFACIAL ADHESION ENERGY OF LAYERED MEMS MATERIALS

Published date

21-09-2017

FOREWORD
1 Scope
2 Normative references
3 Terms and symbols
4 Test piece
5 Testing method and test apparatus
6 Test report
Bibliography

BS IEC 62047-31 Ed1.0.

Committee
EPL/47
DocumentType
Draft
PublisherName
British Standards Institution
Status
Current

IEC 62047-2:2006 Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials
IEC 62047-22:2014 Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates
IEC 62047-9:2011 Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS
IEC 62047-8:2011 Semiconductor devices - Micro-electromechanical devices - Part 8: Strip bending test method for tensile property measurement of thin films
IEC 62047-3:2006 Semiconductor devices - Micro-electromechanical devices - Part 3: Thin film standard test piece for tensile testing

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