BS ISO 21466:2019
Current
The latest, up-to-date edition.
Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM
Hardcopy , PDF
English
18-12-2019
This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method.
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.