BS ISO 23812:2009
Current
The latest, up-to-date edition.
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Hardcopy , PDF
English
31-05-2009
Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
5 Requirements on multiple delta-layer reference materials
6 Measurement procedures
7 Calibration procedures
7.1 Principle of calibration
7.2 Determination of sputtering rate for reference material
7.3 Calibration of the depth scale for test specimens
7.4 Uncertainty in calibrated depth
8 Expression of results
8.1 Calibration under the same sputtering conditions as used
for the reference material
8.2 Calibration using a sputtering rate different from that
of the test specimen
8.3 Calibration with respect to concentration
9 Test report
Annex A (informative) Projected range of oxygen-ion in silicon
Annex B (informative) Estimations of peak shifts due to atomic
mixing
Annex C (informative) Estimations of peak shift due to peak
coalescence
Annex D (informative) Derivation of uncertainty
Bibliography
Describes a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials.
| Committee |
CII/60
|
| DevelopmentNote |
Supersedes 08/30138809 DC. (05/2009)
|
| DocumentType |
Standard
|
| Pages |
0
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
| Supersedes |
1.1
This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials.
1.2 This International Standard is not applicable to the surface-transient region where the sputtering rate is not in the steady state.
1.3 This International Standard is applicable to single-crystalline silicon, polycrystalline silicon and amorphous silicon.
| Standards | Relationship |
| ISO 23812:2009 | Identical |
| ISO 18115:2001 | Surface chemical analysis — Vocabulary |
| ISO 20341:2003 | Surface chemical analysis — Secondary-ion mass spectrometry — Method for estimating depth resolution parameters with multiple delta-layer reference materials |
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