ISO 13424:2013
Current
The latest, up-to-date edition.
Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
Hardcopy , PDF
English
23-09-2013
ISO 13424:2013 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
| Committee |
ISO/TC 201/SC 7
|
| DevelopmentNote |
Supersedes ISO/DIS 13424. (09/2013)
|
| DocumentType |
Standard
|
| Pages |
46
|
| PublisherName |
International Organization for Standardization
|
| Status |
Current
|
| Standards | Relationship |
| BS ISO 13424:2013 | Identical |
| ISO 18118:2015 | Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials |
| ISO 15472:2010 | Surface chemical analysis — X-ray photoelectron spectrometers — Calibration of energy scales |
| ISO 18115-1:2013 | Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy |
| ISO 18117:2009 | Surface chemical analysis — Handling of specimens prior to analysis |
| ISO 21270:2004 | Surface chemical analysis — X-ray photoelectron and Auger electron spectrometers — Linearity of intensity scale |
| ISO/TR 15969:2001 | Surface chemical analysis — Depth profiling — Measurement of sputtered depth |
| ISO 14606:2015 | Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials |
| ISO 18116:2005 | Surface chemical analysis — Guidelines for preparation and mounting of specimens for analysis |
| ISO 19318:2004 | Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of methods used for charge control and charge correction |
| ISO 24237:2005 | Surface chemical analysis — X-ray photoelectron spectroscopy — Repeatability and constancy of intensity scale |
| ISO 16243:2011 | Surface chemical analysis — Recording and reporting data in X-ray photoelectron spectroscopy (XPS) |
| ISO/TR 18392:2005 | Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds |
| ISO 20903:2011 | Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results |
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