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NEN ISO 14237 : 2010

Current

Current

The latest, up-to-date edition.

SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - DETERMINATION OF BORON ATOMIC CONCENTRATION IN SILICON USING UNIFORMLY DOPED MATERIALS

Published date

12-01-2013

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Defines a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron.

DocumentType
Standard
PublisherName
Netherlands Standards
Status
Current

Standards Relationship
ISO 14237:2010 Identical

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