NEN-ISO 21466:2020
Current
The latest, up-to-date edition.
Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM
Hardcopy
English
01-01-2020
NEN-ISO 21466 specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method.
Important note : All end users must be registered with an Account prior to user licenses being assigned.Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.