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SEMI C19 : 2014

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR ACETONE

Published date

12-01-2013

Standardizes requirements for acetone used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown in to give statistically valid results.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Supersedes SEMI C1.2. (03/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

SEMI MF397 : 2006(R2011) TEST METHOD FOR RESISTIVITY OF SILICON BARS USING A TWO-POINT PROBE
SEMI MF1529 : 2010(R2015) TEST METHOD FOR SHEET RESISTANCE UNIFORMITY EVALUATION BY IN-LINE FOUR-POINT PROBE WITH THE DUAL-CONFIGURATION PROCEDURE
SEMI MF374 :2012(R2018) TEST METHOD FOR SHEET RESISTANCE OF SILICON EPITAXIAL, DIFFUSED, POLYSILICON, AND ION-IMPLANTED LAYERS USING AN IN-LINE FOUR-POINT PROBE WITH THE SINGLE-CONFIGURATION PROCEDURE
SEMI MF84:2012 TEST METHOD FOR MEASURING RESISTIVITY OF SILICON WAFERS WITH AN IN-LINE FOUR-POINT PROBE
SEMI MF576 -2012:(R2018) TEST METHOD FOR MEASUREMENT OF INSULATOR THICKNESS AND REFRACTIVE INDEX ON SILICON SUBSTRATES BY ELLIPSOMETRY
ASTM F 576 : 2001 Standard Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry (Withdrawn 2003)

SEMI C44 : 2014 SPECIFICATIONS AND GUIDELINES FOR SULFURIC ACID
SEMI C1 : 2010 GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS

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