SEMI MF1810 : 2010(R2015)
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The latest, up-to-date edition.
TEST METHOD FOR COUNTING PREFERENTIALLY ETCHED OR DECORATED SURFACE DEFECTS IN SILICON WAFERS
Published date
12-01-2013
Specifies the technique to count the density of surface defects in silicon wafers by microscopic analysis. Application of this test method is limited to specimens that have discrete, identifiable artifacts on the surface of the silicon sample.
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