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SEMI P29 : 2011

SEMI P29 : 2011

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies the characteristics specific to attenuated phase shift masks and mask blanks.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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