SEMI P6 : 1988(R2007)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
Published date
12-01-2013
Covers a defined mark placed photolithographically on photomasks for the express purpose of determining the registration accuracy of one imaged photomask to another imaged photomask within the same set of photomasks.
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