ASTM F 804 : 1983 : R1990 : EDT 1
Withdrawn
Practice for Producing Spin Coating Resist Thickness Curves (Withdrawn 1997)
English
12-31-2010
12-31-1997
CONTAINED IN VOL 10.05 1997 Gives method for producing spin coating thickness curves for radiation-sensitive resists on substrates, wafers, and mask blanks. Applies to thicknesses from submicrometre to several micrometres.
| Committee |
F 01
|
| DocumentType |
Standard Practice
|
| Pages |
3
|
| ProductNote |
cr NOTE-Test Method F 907 added to Referenced Document section editoriallv in Julv 1991.
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| ASTM F 127 : 1984 | Definitions of Terms Relating to Relating to Photomasking Technology for Microelectronics (Withdrawn 1992) |
| FED-STD-209 Revision E:1992 | Airborne Particulate Cleanliness Classes in Cleanrooms and Clean Zones (S/S by ISO14644-1 and ISO14644-2) |
| ASTM F 66 : 1984 : R1990 | Test Methods for Testing Photoresists Used in Microelectronic Fabrication (Withdrawn 1996) |
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