ASTM F 127 : 1984
Withdrawn
Withdrawn
Definitions of Terms Relating to Relating to Photomasking Technology for Microelectronics (Withdrawn 1992)
Published date
12-31-2010
Withdrawn date
12-31-1993
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CONTAINED IN VOL 10.05 1995 Lists and defines terms.
| DocumentType |
Reference Material
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| ASTM F 804 : 1983 : R1990 : EDT 1 | Practice for Producing Spin Coating Resist Thickness Curves (Withdrawn 1997) |
| ASTM F 691 : 1980 : R1991 : EDT 1 | Practice for Preparing Photoplates for Measuring Flatness Deviation (Withdrawn 1996) |
| ASTM F 908 : 1985 : R1990 | Practice for Evaluating Safelights for Photoresists (Withdrawn 1996) |
| ASTM F 864 : 1984 : R1992 | Practice for Inspection of Hardsurface Glass Photoplates (Withdrawn 1996) |
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