ASTM F 864 : 1984 : R1992
Withdrawn
Practice for Inspection of Hardsurface Glass Photoplates (Withdrawn 1996)
English
12-31-2010
01-01-1996
CONTAINED IN VOL 10.05 1997 Describes inspection of hard-surface glass photoplates to produce photomasks for semiconductor and microelectronic device fabrication. Applies to hard photoplates without photoresist. Limited to detecting surface contamination, gross defects, surface scratches and pinholes. Subjective, depends upon equipment used, types and sizes of defects and observer's judgement.
| Committee |
ASTM
|
| DocumentType |
Standard Practice
|
| Pages |
3
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| ASTM F 127 : 1984 | Definitions of Terms Relating to Relating to Photomasking Technology for Microelectronics (Withdrawn 1992) |
| FED-STD-209 Revision E:1992 | Airborne Particulate Cleanliness Classes in Cleanrooms and Clean Zones (S/S by ISO14644-1 and ISO14644-2) |
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