BS EN 62047-26:2016
Current
The latest, up-to-date edition.
Semiconductor devices. Micro-electromechanical devices Description and measurement methods for micro trench and needle structures
Hardcopy , PDF
English
31-05-2016
| Committee |
EPL/47
|
| DevelopmentNote |
Supersedes 14/30294910 DC. (05/2016)
|
| DocumentType |
Standard
|
| Pages |
34
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
| Supersedes |
IEC 62047-26:2016 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 µm to 100 µm; walls and trenches with respective widths of 5 µm to 150 µm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 µm or larger, and with dimensions that fit inside a cube with sides of 100 µm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.
| Standards | Relationship |
| EN 62047-26:2016 | Identical |
| IEC 62047-26:2016 | Identical |
| DIN EN 62047-26:2016-12 | Equivalent |
| I.S. EN 62047-26:2016 | Equivalent |
| EN 60793-2-30:2009 | Identical |
| UNE-EN 62047-26:2016 | Equivalent |
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