UNE-EN 62047-26:2016
Current
The latest, up-to-date edition.
Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures (Endorsed by AENOR in June of 2016.)
Hardcopy , PDF
English
01-06-2016
This part of IEC 62047 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 ¼m to 100 ¼m; walls and trenches with respective widths of 5 ¼m to 150 ¼m; and aspect ratio of 0,0067 to 20. For needle structures, the standard applies to structures with a height, horizontal width and vertical width of 2 ¼m or larger, and with dimensions that fit inside a cube with sides of 100 ¼m.
This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.
| Committee |
CTN 209/SC 47
|
| DocumentType |
Standard
|
| Pages |
35
|
| PublisherName |
Asociación Española de Normalización
|
| Status |
Current
|
| Standards | Relationship |
| DIN EN 62047-26:2016-12 | Equivalent |
| I.S. EN 62047-26:2016 | Equivalent |
| BS EN 62047-26:2016 | Equivalent |
| EN 62047-26:2016 | Identical |
| IEC 62047-26:2016 | Identical |
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