ASTM F 154 : 2002
Withdrawn
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)
English
01-10-2001
11-05-2013
CONTAINED IN VOL. 10.05, 2001 Lists, illustrates, and defines various characters, features, and contaminants seen on highly specular silicon, and gives recommended methods for observing these surface defects. Defects and common synonyms are arranged alphabetically using common name and most probable origins. Describes surfaces after mechanical and chemical polishing, and polished surfaces examined after epitaxial deposition.
| Committee |
F 01
|
| DocumentType |
Guide
|
| Pages |
14
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Withdrawn
|
| Supersedes |
This standard was transferred to SEMI (www.semi.org) May 2003
1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .
| 09/30207175 DC : 0 | BS EN 62276 - SINGLE CRYSTAL WAFERS FOR SURFACE ACOUSTIC WAVE (SAW) DEVICE APPLICATIONS - SPECIFICATIONS AND MEASURING METHOD |
| ASTM F 522 : 1994 | Test Method for Stacking Fault Density of Epitaxial Layers of Silicon by Interference-Contrast Microscopy (Withdrawn 1998) |
| ASTM F 1241 : 1995 : R2000 | Standard Terminology of Silicon Technology (Withdrawn 2003) |
Please Login or Create an Account so you can add users to your Multi user PDF Later.
Important note : All end users must be registered with an Account prior to user licenses being assigned.
Users cannot be edited or removed once added to your Multi user PDF.